Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Development of Photosensitive Insulating Materials by Organic-Inorganic Hybrid Technologies
Azuma KenichiNakamura ShigeruUnate TakaoNakasuga AkiraMatsukawa Kimihiro
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2005 Volume 18 Issue 1 Pages 41-46

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Abstract

Novel photosensitive insulating materials by organic-inorganic hybrid technologies have been developed. These materials are comprised of organic silsesquioxane (OSQ) and photo acid generators (PAGs). OSQ is soluble in alkaline solutions. After UV light was exposed to OSQ and post exposure baking (PEB), OSQ was cross-linked and became insoluble in alkaline solutions of the resulting patterns with high photosensitivity. We found that the OSQ with low post-baking temperature had high insulating performance and transparency

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© 2005 The Society of Photopolymer Science and Technology (SPST)
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