Design of Protective Topcoats for Immersion Lithography

Robert D. Allen; Phillip J. Brock; Linda Sundberg; Carl E. Larson; Gregory M. Wallraff; William D. Hinsberg; Jeff Meute; Tsutomu Shimokawa; Takashi Chiba; Mark Slezak

doi:10.2494/photopolymer.18.615

Robert D. Allen, Phillip J. Brock, Linda Sundberg, Carl E. Larson, Gregory M. Wallraff, William D. Hinsberg, Jeff Meute, Tsutomu Shimokawa, Takashi Chiba, Mark Slezak

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Keywords: immersion lithography, topcoats, PAG extraction, leaching, fluoropolymers

JOURNAL FREE ACCESS

2005 Volume 18 Issue 5 Pages 615-619

DOI https://doi.org/10.2494/photopolymer.18.615

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Abstract

Interactions of water and 193nm resists are described and detailed. Leaching of PAGs is experimentally verified, and the influence of PAG structure on leaching rate is determined. The mode of action of immersion topcoats is described. The influence of the topcoat/resist interaction in assessed. Finally, the design evolution of immersion topcoats with desirable properties is discussed.

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