Nanoscale Characterization in Resist Processing by using Atomic Force Microscope

Abstract

With the invention of the atomic force microscope (AFM), we have been equipped with the appropriate tools to clarify surface and interface properties of condensed matter on nanometer scale. As an application of AFM on resist processing, the present author has already studied resist pattern adhesion, Young's modulus estimation, Surface hardened layer analysis by tip indentation and manipulation of polymer aggregate. Moreover, nanobubble analysis for immersion lithography has been analyzed. The AFM technique gives useful information to the field of the designing of resist processing.