Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Study of Polybenzoxazole Precursors for Low Temperature Curing
Ken-ichi Iwashita, Takashi Hattori, Tomonori Minegishi, Shinji Ando, Fumihiro Toyokawa, Mitsuru Ueda
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Keywords: positive-working, semi-alicyclic poly(amide acid), chemical amplification
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Volume 19 (2006) Issue 2 Pages 281-282

DOI https://doi.org/10.2494/photopolymer.19.281
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© 2006 The Society of Photopolymer Science and Technology (SPST)
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