Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography
A. D. AllenG. BreytaP BrockR. DiPietroD. SandersR. SooriyakumaranL. K. Sundberg
Author information
JOURNALS FREE ACCESS

Volume 19 (2006) Issue 5 Pages 569-572

Details
Download PDF (1344K) Contact us
Abstract

The fundamental properties of a series of hexafluoroalcohol-bearing methacrylate polymers (HFA-MA) are reported here. The material behavior is heavily influenced by the linking group between the methacrylate ester (or polymer backbone) and the hexafluoroalcohol (HFA) group. These materials form the basis for a variety of positive and negative resists, as well as immersion topcoats. Detailed structure/property relationships of these homopolymers and copolymers will be discussed. Finally, polymer blending results of dissimilar homopolymers are compared with copolymers of the same composition.

Information related to the author
© 2006 The Society of Photopolymer Science and Technology (SPST)
Next article

Recently visited articles
feedback
Top