Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Trends in Patterning Materials for Advanced Lithography
Robert D. Allen
Author information
Keywords: immersion lithography, 193nm photoresists, imprint lithography
JOURNAL FREE ACCESS

2007 Volume 20 Issue 3 Pages 453-455

Details
Download PDF (222K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists.
Content from these authors
© 2007 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top