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Journal of Photopolymer Science and Technology
Vol. 20 (2007) No. 4 P 511-517



A review of the method, results, and possible benefits of the directed assembly of block copolymers on lithographically defined, chemically nanopatterned substrates. Insertion of block copolymers into the lithographic process showed the potential to reduce critical dimension variation in the lithographic process by correcting for process variations in the original lithographically defined pattern. The ability of directed assembly of block copolymers to yield a variety of device oriented patterns while maintaining registration to the substrate and a high degree of perfection was demonstrated. Directed assembly of block copolymers was also able to generate structures that do not naturally occur in the bulk, such as square arrays of cylindrical domains and quadratically perforated lamellae.

Copyright © 2007 The Society of Photopolymer Science and Technology (SPST)

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