Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Micro Patterning Using UV-Nanoimprint Process
Hiroshi GotoAkihiko HagiwaraKentaro IshibashiMitsunori KokuboHiroshi OkuyamaSatoshi Fukuyama
Author information
JOURNAL FREE ACCESS

2007 Volume 20 Issue 4 Pages 559-562

Details
Abstract

Nanoimprint process is a simple and a low cost micro/nano fabrication method based on mold replication principle. UV nanoimprint has capable of high accuracy and precise patterning because of lower press force and lower heat generation process comparing with thermal nanoimprint. Therefore, various kinds of devices required high accuracy patterning such as optical devices, patterned medias,electronics and MEMS devices are greatly expected as UV nanoimprint applications. In this paper, our recent progress including tools and replication results on UV nanoimprint is described.

Content from these authors
© 2007 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
feedback
Top