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Journal of Photopolymer Science and Technology
Vol. 20 (2007) No. 4 P 559-562

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http://doi.org/10.2494/photopolymer.20.559


Nanoimprint process is a simple and a low cost micro/nano fabrication method based on mold replication principle. UV nanoimprint has capable of high accuracy and precise patterning because of lower press force and lower heat generation process comparing with thermal nanoimprint. Therefore, various kinds of devices required high accuracy patterning such as optical devices, patterned medias,electronics and MEMS devices are greatly expected as UV nanoimprint applications. In this paper, our recent progress including tools and replication results on UV nanoimprint is described.

Copyright © 2007 The Society of Photopolymer Science and Technology (SPST)

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