Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Peeling Analysis of ArF Resist Pattern on BARC by using AFM
Kazutoshi Kurano, Takahiro Kishioka, Yoshiomi Hiroi, Takuya Ohashi, Akira Kawai
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Keywords: BARC, atomic force microscopy (AFM), pattern collapse, direct peeling method with AFM Tip (DPAT)
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Volume 20 (2007) Issue 6 Pages 825-826

DOI https://doi.org/10.2494/photopolymer.20.825
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© 2007 The Society of Photopolymer Science and Technology (SPST)
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