Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Simulation and Mitigation of Pattern and Process Dependencies in Nanoimprint Lithography
Hayden Taylor
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Volume 24 (2011) Issue 1 Pages 47-55

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Abstract

In this paper we review the most important known sources of defects in nanoimprint lithography (NIL). The review encompasses the thermal, ultraviolet-curing and step-and-repeat variants of NIL, and addresses both systematic and random sources of residual layer thickness (RLT) variation, incomplete stamp cavity filling, and other defects. Approaches to simulating these NIL processes are surveyed. Strategies are analyzed for reducing RLT variation as well as the number and severity of defects, and opportunities for future innovations are highlighted.

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© 2011 The Society of Photopolymer Science and Technology (SPST)
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