Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Recent EUV Resists toward High Volume Manufacturing
Hisashi NakagawaTakehiko NaruokaTomoki Nagai
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2014 Volume 27 Issue 6 Pages 739-746

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Abstract

Extreme ultraviolet lithography (EUVL) has been an attractive method as next generation lithography (NGL) over 20 years, and high-volume manufacturing (HVM) is now going to be realized by great progresses in materials as well as EUV source power enhancement. In this paper, recent reported materials for EUVL are summarized ranging from conventional organic material base resists to novel inorganic material base resists.

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© 2014 The Society of Photopolymer Science and Technology (SPST)
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