Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Ion Exchange of Organic Ionic Compounds in Photoresist
Eui-Hyun RyuChang-Young HongMin Kyung JangMyung-Yeol KimDong Yong KimJae Yun AhnHae-Jin LimHyun JeonMichael ClarkJames ThackerayHankyul LeeHyungjun Kim
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2015 Volume 28 Issue 5 Pages 695-700

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Abstract

Organic ionic compounds, such as photo-acid generators (PAGs) and photo-decomposable quenchers (PDQs), are solvated in organic solvents. During this process, organic ionic comounds can be solvated only in an associated salt form or both in an associated salt form and a dissociated ionic form. In order to understand this behavior, we carried out (1) the binding energy calculation of photo-acid generator (see, Figure 1) in various solvents, (2) the Job plots with 1H NMR spectroscopy for detecting the dissociated anions of organic ionic compounds by a bidentated hydrogen bonding, and (3) GCIB-SIMS analysis to monitor the distribution of cations and anions along the depth of coated photoresist layer. Based on the computational and experimental results, we propose that organic ionic compounds are solvated in both an associated salt form and a dissociated ionic form in equilibrium state resulting in ion exchange of cations and anions in mixed organic ionic compounds.

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© 2015 The Society of Photopolymer Science and Technology (SPST)
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