Synthesis and Characterization of Si-containing Block Co-polymers with Resolution beyond 10 nm

Yasunobu Someya; Yusuke Asano; Michael J. Maher; Gregory Blachut; Austin P. Lane; Stephen Sirard; Christopher J. Ellison; C. Grant Willson

doi:10.2494/photopolymer.29.701

Yasunobu Someya, Yusuke Asano, Michael J. Maher, Gregory Blachut, Austin P. Lane, Stephen Sirard, Christopher J. Ellison, C. Grant Willson

Author information

Yasunobu Someya
McKetta Department of Chemical Engineering, The University of Texas at Austin
Yusuke Asano
McKetta Department of Chemical Engineering, The University of Texas at Austin
Michael J. Maher
Department of Chemistry, The University of Texas at Austin
Gregory Blachut
McKetta Department of Chemical Engineering, The University of Texas at Austin
Austin P. Lane
McKetta Department of Chemical Engineering, The University of Texas at Austin
Stephen Sirard
Lam Research Corp.
Christopher J. Ellison
McKetta Department of Chemical Engineering, The University of Texas at Austin
C. Grant Willson
McKetta Department of Chemical Engineering, The University of Texas at Austin
Department of Chemistry, The University of Texas at Austin

Keywords: directed self-assembly, block co-polymer, patterning, styrene

JOURNAL FREE ACCESS

2016 Volume 29 Issue 5 Pages 701-704

DOI https://doi.org/10.2494/photopolymer.29.701

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Abstract

Block co-polymers that include a Si-containing styrene monomer co-polymers were synthesized by living anionic polymerization. These polymers with very low polydispersity demonstrated lamella morphology that can be oriented by annealing with a neutral, crosslinkable surface treatment and a neutral top-coat.

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