Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)

抄録

We examined the synthesis, physical properties, and resist properties of the various polymers and an oligomer containing fixed hole derived from calixarenes. By the condensation reaction of p-t-butylcalix[n]arene (n = 4 and 8) with 1,4-dichloro-2-oxabutane (DCB) and 2,5-dibromoacetyloxy-2,5-dimethylhexane (DBH), the soluble polymers poly(BCA[8]-co-DCB), poly(BCA[8]-co-DBH), and poly(BCA[4]-co-DCB), and an oligomer BCA[4]-DBH were obtained. They have good physical properties (solubility, film-forming ability, high thermal stability), excellent thickness loss property, and good acid-deprotection reactivity upon ultra-violet (UV) irradiation. The resist-sensitivity in an extreme ultraviolet (EUV) exposure tool indicated that poly(BCA[8]-co-DBH) and BCA[4]- DBH were good candidate to offer higher resolution resist pattern, i.e., E₀ = 5.0 mJ/cm² [poly(BCA[8]-co-DBH] and 0.8 mJ/cm² (BCA[4]-DBH).