Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials
Yuji HosakaHiroki YamamotoMasahiko IshinoThanh-Hung DinhMasaharu NishikinoAkira KonShigeki OwadaYuichi InubushiYuya KubotaYasunari Maekawa
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2021 Volume 34 Issue 1 Pages 95-98

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Abstract

Irradiation effects of poly(methyl methacrylate) (PMMA) induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation extreme ultraviolet free electron laser (EUV-FEL) lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. The sensitivity enhancement upon exposure to femtosecond-pulsed SXFEL is similar to the result obtained using laser-induced-plasma based Soft X-ray laser (SXRL) (picosecond-pulsed EUV). This result speculates the reactions induced by femtosecond-pulsed SXFEL and picosecond-pulsed XRL were almost same, but it was different from those induced by nanosecond-pulsed EUV.

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© 2021 The Society of Photopolymer Science and Technology (SPST)
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