Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
A Novel Low Molecular-Weight Organic Resist with High Sensitivity for Nanometer Lithography
Toshiaki Kadota, Hiroshi Kageyama, Fujio Wakaya, Kenji Gamo, Yasuhiko Shirota
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Keywords: amorphous molecular material, molecular resist, negative electron-beam resist, sensitivity, resolution, 1,3,5-tris[4-(4-vinylphenylcarbonyloxy)phenyl]benzene
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Volume 11 (1998) Issue 1 Pages 147-148

DOI https://doi.org/10.2494/photopolymer.11.147
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© The Technical Association of Photopolymers, Japan
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