Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Effects of Photoacid Generator Concentration and Post-Exposure Bake Temperature on Dissolution Behavior of ArF Excimer Laser Resists
Kenichi Kanzaki, Takeshi Ohfuji, Seiichi Tagawa
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Keywords: chemically amplified resist, AFM, resist surface, development, acid diffusion, ArF excimer laser
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Volume 12 (1999) Issue 5 Pages 735-738

DOI https://doi.org/10.2494/photopolymer.12.735
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© The Technical Association of Photopolymers, Japan
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