Studies on the Thin Films of Poly(di-<i>n</i>-hexylsilane) Using Slow Positron Beam Technique

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244

Studies on the Thin Films of Poly(di-n-hexylsilane) Using Slow Positron Beam Technique

Mutsumi Tashiro, Pradeep K. Pujari, Shu Seki, Yoshihide Honda, Tomohiro Yamaguchi, Ryoichi Suzuki, Seiichi Tagawa

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Keywords: poly(di-n-hexylsilane), slow positron beam, lifetime, thin film, free-volume

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Volume 12 (1999) Issue 5 Pages 743-745

DOI https://doi.org/10.2494/photopolymer.12.743

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© The Technical Association of Photopolymers, Japan

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