New Positive-type Chemically Amplified Photosensitive Poly(phenylene ether): 4. Partially tert-Butoxycarbonylated Poly(2-hydroxy-6-methylphenol-co-2, 6-dimethylphenol) with a Photoacid Generator

Yasuyuki Sasada; Makoto Tamamura; Yuji Shibasaki; Mitsuru Ueda

doi:10.2494/photopolymer.14.51

New Positive-type Chemically Amplified Photosensitive Poly(phenylene ether): 4. Partially tert-Butoxycarbonylated Poly(2-hydroxy-6-methylphenol-co-2, 6-dimethylphenol) with a Photoacid Generator

Yasuyuki Sasada, Makoto Tamamura, Yuji Shibasaki, Mitsuru Ueda

著者情報

キーワード: positive-type photosensitive polymer, chemically amplified resist, poly(phenylene ether), oxidative coupling polymerization, photoacid generator

ジャーナルフリー

2001 年 14 巻 1 号 p. 51-53

DOI https://doi.org/10.2494/photopolymer.14.51

詳細

責任著者(Corresponding author)

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