Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Organic-Inorganic Hybrid Type Electron Beam Resist
Toshiyuki Tamai, Yukihito Matsuura, Kimihiro Matsukawa, Hiroshi Inoue, Tetsuya Hamamoto, Hiroshi Toyota, Kazuo Satoh
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Keywords: EB Resist, Lithography, Organic-Inorganic Hybrid, Sol-Gel Process, Reactive Ion Etching
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Volume 14 (2001) Issue 2 Pages 185-188

DOI https://doi.org/10.2494/photopolymer.14.185
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© The Technical Association of Photopolymers, Japan
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