Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Acryl Polymer-Silica Hybrid for Electron Beam Resist
Toshiyuki Tamai, Kimihiro Matsukawa, Yukihito Matsuura, Hiroshi Inoue, Hiroshi Toyota, Kazuo Satoh, Hiroki Fukuda
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Keywords: EB Resist, Lithography, Organic-Inorganic Hybrid, Reactive Ion Etching
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Volume 15 (2002) Issue 1 Pages 19-22

DOI https://doi.org/10.2494/photopolymer.15.19
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© The Technical Association of Photopolymers, Japan
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