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Journal of Photopolymer Science and Technology
Vol. 15 (2002) No. 3 P 475-480



Nano-imprint lithography is one of the promising technologies for low cost mass production of Giga-bit-scale integration systems. This paper demonstrates various possibility of the nano-imprint lithograph for fine pattern fabrication. Fabrication of optical elements or bio-chemical analysis systems is one of the suitable field of nano-imprint lithography, because the resist structure it's self works as an functional element such as a diffractive grating, an anti-reflection structure or a fluid channel. Also, application of nano-imprint lithography to various materials are discussed such as acrylic plate, glass plate and biodegradable polymer.

Copyright © The Technical Association of Photopolymers, Japan

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