Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
Acid Hardening Positive Photoresist using Photochemical Generation of Base
Mark R. Winkle, Karen A. Graziano
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Volume 3 (1990) Issue 3 Pages 419-422

DOI https://doi.org/10.2494/photopolymer.3.419
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© The Technical Association of Photopolymers, Japan
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