Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
CHEMICALLY AMPLIFIED RESISTS III. THE FINAL PHENOLIC PRODUCT FORMATION MECHANISM FROM t-BOC.
RIEKO ICHIKAWA, MINORU TSUDA, SETSUKO OIKAWA
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Volume 6 (1993) Issue 1 Pages 23-26

DOI https://doi.org/10.2494/photopolymer.6.23
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© The Technical Association of Photopolymers, Japan
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