Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
t-BOC BASED RESISTS: A POLYMERIC PLATFORM FOR ≤ 0.25μm LITHOGRAPHIC TECHNOLOGIES
Omakaram Nalamasu, Anthony E. Novembre, Janet M. Kometani, James E. Hanson
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Volume 6 (1993) Issue 4 Pages 457-472

DOI https://doi.org/10.2494/photopolymer.6.457
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© The Technical Association of Photopolymers, Japan
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