Proceedings of JSPE Semestrial Meeting
2008 JSPE Spring Conference
Session ID : K20
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Host: The Japan Society for Precision Engineering

Low-temperature and high-rate growth of microcrystalline silicon films by atmospheric-pressure plasma chemical vapor deposition
*Kentaro Ouchi, Ryouhei Inudzuka, Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
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Keywords: microcrystalline silicon, low-temperature and high-rate growth, atmospheric-pressure PCVD
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[in Japanese]
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© 2008 The Japan Society for Precision Engineering
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