Generation of High-power Underwater Ultrasound by Using a Reflective Surface Focusing Structure

Abstract

Next generation ultrasound cleaning technology is effective in removing fine stains, and in recent years, its application to cleaning silicon wafers has attracted significant attention. To achieve high-efficiency cleaning without causing defects on the silicon wafer surface, it is necessary to drive at a high frequency band with a high cavitation threshold. However, current ultrasonic cleaning devices face challenges, such as the difficulty of performing cleaning at frequencies above the MHz range. In this study, high-power operation in the MHz range was achieved by focusing ultrasound with parabolic reflection surface.