溶接学会論文集
Print ISSN : 0288-4771
蒸着薄膜および電着メッキ層の残留応力解析
豊田 政男吹田 義一平野 俊雄中村 茂昭山本 斌曠草薙 一正三谷 英機
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1989 年 7 巻 4 号 p. 543-548

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This paper is concerned with the theoretical evaluation of residual stresses in multilayered structures fabricated on substrates, such as evaporated films and plating films.
Firstly, the analysis of thermal stresses in multilayered elastic thin films is carried out by using the method of strain suppression. Next, the theoretical formulas for evaluation of residual stresses arising in thin films and substrates are derived by the use of combining the results of the thermal stress analysis and those of stresses due to the inherent strains of the thin film. Furthermore the controlling parameters of residual stresses are derived theoretically.
Experimental results of residual stresses in evaporated Ag films and hard chrominum plating films agree approximately with theoretical ones.

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