タンデトロンMeV加速器注入システムの性能評価

抄録

Performance test of ion implantation system in tandetron MeV accelerator was investigated by measuring of dose and dose uniformity of implanted ion.
The Au content of four samples which were cut from the alminum specimen were determined by a neutron activation analysis after implantation of 3.99 -5.1 MeV Au²⁺. The Au contents (D_NAA) of samples were more than the Au doses (D_ICM) which were determined by current integration, because of charge changing of Au²⁺ into lower. The dose uniformities were drifted, for reason of ion beam moving which occured in the Cs sputter ion source.
From these finding, it was estimated that the doses increased 10% approximately and the dose uniformities had the error of 5% approximately as the ability of ion implantation system in tandetron MeV accelerator.