ホローカソード放電法で作製したダイヤモンド状炭素膜および窒化炭素膜の特性評価

抄録

Diamond-like carbon (DLC) and carbon nitride (C-N) films have the superior properties of hardness and wear-resistance. They have been investigated extensively for several applications. In this present study, DLC and C-N films were prepared on silicon wafers, stainless steel sheets, high speed steel blocks and WC-Co tips by the hollow cathode discharge method at the high deposition rate of 0.3μm/min. Silicon or tungsten carbide-cobalt was deposited as an interlayer in order to improve the adhesion of DLC and C-N films. Raman spectra of the DLC and C-N films showed distinct D and G bands. The indenting hardness of the C-N films was found to be larger than that of the DLC films. The intensity ratio of the D band to G band in the DLC films related linearly to the indenting hardnesses. On the other hand, the intensity ratios in the C-N films were almost constant in spite of the different conditions of deposition. The indenting hardness in the C-N films depended on the amount of contained nitrogen. The DLC films exhibited a lower friction coefficient compared with the C-N films.