表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
技術論文
電析法によるPt-Ni合金薄膜の作製
福井 麻紀子小早川 紘一齋藤 誠佐藤 祐一
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ジャーナル フリー

2004 年 55 巻 7 号 p. 495

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In order to enhance the electrocatalytic activities of a hydrogen electrode and lower the price of the electrode, the possibility of Pt-Ni alloy plating as the electrode material formation was studied. It is generally hard to codeposit Pt and Ni, because they have considerably different standard oxidation-reduction potentials. Complexing agents were surveyed to bring the oxidation-reduction potentials of both Pt and Ni closer by drawing immersion potential-pH diagrams. Glycine was found to be useful for Pt ion as a complexing agent. The best electroplating condition was determined by measuring the current-potential curves of Pt and Ni ions and analysing the composition of the deposits. The plating bath composition was investigated by changing the Ni concentration and pH. The optimum bath composition and conditions were 0.009mol/dm3 NiCl2·6H2O, 0.001mol/dm3 K2[PtCl4] and pH4. It was confirmed by XRD analysis that the plating film obtained at optimum conditions was a Pt-Ni alloy. By changing the current density of the electroplating from 0.15A/dm2 to 1.0A/dm2, thin Pt-Ni alloy films could be obtained with Ni content between 35mol% and 67mol%. The film thickness obtained in this study was between 0.42μm and 0.75μm, and each metal was distributed uniformly on the surface and also in the depth direction.

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© 2004 一般社団法人 表面技術協会
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