Journal of The Surface Finishing Society of Japan
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
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Low-temperature and High-rate Deposition of Microcrystalline Si Films Using Atmospheric-pressure Very High-frequency Plasma
Hiroaki KAKIUCHI, Hiromasa OHMI, Kiyoshi YASUTAKE
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Keywords: Atmospheric-pressure Plasma, Microcrystalline Silicon, Low-temperature Growth, High-rate Deposition, Porous Carbon Electrode
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2009 Volume 60 Issue 6 Pages 371

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Journal of the Metal Finishing Society of Japan

Genba Panfuretto

Jitsumu Hyomen Gijutsu

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