表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
技術論文
イオン液体から成膜されたアルミニウム電気めっき膜の陽極酸化によるポーラスアルミナの形成
藤井 大地方 雪琴郡司 貴雄金子 信悟田邉 豊和松本 太
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2015 年 66 巻 4 号 p. 153-157

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Porous alumina was prepared by anodizing electrochemically deposited aluminum(Al)films in an acidic aqueous solution. The Al films were electrodeposited on copper plates from ionic liquid baths containing Al3+ ions. AlCl3-trimethylphenylammonium chloride (TMPAC), AlCl3- 1-ethyl-3-methylimidazolium chloride (EMIC), and Al3Cl-1-butyl-1-methylpyrrolidium chloride (BPC) were used as ionic liquid baths for Al electroplating. The Al film deposited from the AlCl3-EMIC bath was the thickest among the films obtained from baths. The Al films plated from ionic liquid baths were then anodized at 40 V in 0.8 M oxalic acid aqueous solution at 16 °C for 4 h to form porous alumina films, which showed arrayed pores of the same diameter in arrangements that were mutually parallel and perpendicular to the substrate surface. The average hole period was 99-106 nm.

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