表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
研究論文
CoFeNi磁性膜の交流軟磁気特性に対する電流パルスリバース印加の効果
小林 竜馬湯本 敦史阿相 英孝鷹野 一朗
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ジャーナル フリー

2016 年 67 巻 11 号 p. 607-613

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Using pulse-reverse electrodeposition with a dual cell method, CoFeNi films were formed on ring-shaped copper substrates under galvanostatic pulse mode. The dual cell comprised a pair of anode and cathode cells that were mutually connected electrochemically through a salt bridge. The effects of solution pH in a cathode cell and the average current density on compositional, structural, and magnetic properties of the obtained films were investigated using SEM-EDS, XRD, and BH analyze(rmeasured at 5000 A m-1 and 50 Hz, 1.6 A m-1, and 1-1000 kHz). All regions of cross-sectional electrodeposited CoFeNi films consisting of nano-crystallites exhibited uniform composition. As a result of AC soft magnetic properties, Fe contents in the films increased and Ni contents in the films decreased with decreasing pH of the solution, thereby raising the maximum magnetic flux density(Bm). These results imply that a CoFeNi film with excellent magnetic properties can be formed by decreasing the solution pH. It has been suggested that CoFeNi films with excellent magnetic properties can be produced by decreasing the solution pH. The Co57Ni14Fe29 film formed by applying average current density of 16 mA cm-2 in a solution of pH 2.0 showed the most suitable soft-magnetic properties found in this study: low coercivity of 244 Am-1 and high Bm of 1.97 T.

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