表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
銅 (II) -EDTA浴からのパルス電析効率におよぼす磁場の影響
千葉 淳小倉 浩嗣小川 忠彦山下 嗣人
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1989 年 40 巻 6 号 p. 784-785

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Deposition efficiencies in the presence of magnetic fields increased with longer on-time and higher current density, but an supplementary, magnetic field effect appeared when off-time was prolonged. It was demonstrated that one of the magnetic field effects was due to the fact that Lorentz force caused replenishment of copper ions on the cathode. Magnetic fields can not be expected to produce any positive effects on pulse plating.

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