クロムめっき浴からの窒化クロムの誘起共析

抄録

Electroplated films obtained from chromic acid plating baths containing NaNO₃ were investigated using XPS analysis and X-ray diffraction.
When the concentration of NaNO₃ in the plating bath was raised to 4mM, the amount of nitrogen involved in the films increased to 4.2at%. Binding energy of N 1s and Cr 2p_3/2 observed on XPS spectra for films indicated the existence of a kind of Cr-N compound. X-ray diffraction patterns showed that as-deposited film had hcp crystal structure and did not contain chromium nitrides (Cr₂N or CrN). With heat treatment at 600°C for 4 hours the crystal structure changed from an hcp deposit to bcc chromium including chromium nitride.