1996 年 47 巻 12 号 p. 1048-1053
The optical and electrical properties of RF-sputtered Al-N films have been controlled by changing the content of nitrogen gas and total sputtering pressure. For Al-rich Al-N films, post-N+-implantation and post-heat-treatment in a nitrogen atmosphere effectively change optical and electrical properties. A new, colorful, wear-resistant, anticorrosion AlN/Al/AlN film has been made by adding a very thin layer of Al between two stoichiometric AlN layers, based on the phenomenon that the coloration of Al-N films is mainly caused by the extra Al in the film and the interference of light. A compositionally and structurally gradient Al-AlN film was fabricated. The structure, morphology, and Al element distribution across the cross section of the gradient film was investigated using X-ray diffraction, SEM, and EMPA