スパッタリングによるWO3膜の形成条件とEC特性
1996 年 47 巻 9 号 p. 773-778
詳細
1996 年 47 巻 9 号 p. 773-778
The relationship between conditions for preparing WO3 films and their electrochromic properties was investigated.
WO3 thin films were prepared by RF magnetron sputtering with various Ar gas pressures and RF powers.
Their optical density, coloring efficiency, and response time for coloration and bleaching were measured in a 0.5M solution of KH2PO4.
The chemical composition, optical gap, and morphology of prepared WO3 films were measured, and their relationship and electrochromic properties were discussed.
The results are as follows:
1. The WO3 film prepared under an Ar gas pressure of 1.0×10-2torr or under an RF power of 100-150W showed the best electrochromic properties. This seems closely related to chemical composition and the optical gap of WO3 films.
2. The coloration response time grew slower with increased Ar gas pressure or decreased RF power.
The bleaching response time remained virtually unchanged. These characteristics depend on obtaining fine grains and on the nonhomogeneity of the prepared WO3 films.
