Tiイオン注入による炭素薄膜の構造変化
1997 年 48 巻 3 号 p. 313-316
詳細
1997 年 48 巻 3 号 p. 313-316
Titanium ions accelerated at between 70 and 30kV were implanted in carbon thin films deposited on stainless steel and graphite substrates at room temperature to study structure changes in films and improve adhesion strength at the film/substrate interface. Film structure and composition were studied by grazing incidence X-ray diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy. Adhesion strength was measured using a pull test. TiC crystalline phase formation in carbon thin films by titanium implantation was observed. The graphitic structure in evaporated films and graphite substrate were changed to an amorphous structure by ion implantation. Film adhesion strength was enhanced by ion implantation, which generated a well mixed layer at the film/substrate interface.
