表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
超音速分子線を用いたArFエキシマレーザー誘起CVD法による金属光沢薄膜の形成
本田 数博
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ジャーナル フリー

1999 年 50 巻 1 号 p. 95-98

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ArF eximer-laser-induced chemical vapor deposition (CVD) of coordinated unsaturated species of ironpentacarbonyl on quartz glass was conducted using a supersonic molecular beam. Fabricated thin films turned from black to metallic silver based on the number of laser shots. Ultraviolet absorption spectra from 200 to 350 nm indicated that black thin films were due to induced plasma oscillation in which coordinatied unsaturated ironpentacarbonyl spacies changed to fine metallic particles. For metallic thin films, electron microscopy clarified a meshes structure in which thin films were fabricated proceed through a three-dimensional Volmer-Weber mechanism.
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