Abstract of annual meeting of the Surface Science of Japan
29th annual meeting of the Surface Science Society of Japan
Session ID : 1B02S
Conference information

Host: The Surface Science Society of Japan

October27
HfSiON film growth by N2 plasma exposure to Hf liquid nano dot
*Ryousuke Kage, Takeshi Kitajima, Toshiki Nakano
Author information
CONFERENCE PROCEEDINGS FREE ACCESS

Details
Download PDF (34K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Abstract
[in Japanese]
Content from these authors
© 2009 The Surface Science Society of Japan
Previous article Next article
Favorites & Alerts

Recently viewed articles
Predecessor

Abstract of annual meeting of the Surface Science of Japan

Successor

Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science

Share this page
feedback
 Top