飽和に近い条件におけるガラス固化体の溶解メカニズムに関する研究の現状と今後の課題

抄録

  Based on an extended literature survey covering recent studies on high-level radioactive glass dissolution under nearly saturated conditions, we have reached the conclusion that the slow dissolution is controlled by the diffusion of oxonium or boron ions in an altered layer formed on the glass surface. Experimental approaches, such as an elaborate and systematic diffusion experiment using isotopes, were proposed to validate the mechanism. It was also pointed out that the dissolution model applicable to glass waste form performance evaluation takes into account the surface area evolution, the stability of the altered layer, and the interactions with near-field materials.