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炭素
Vol. 2010 (2010) No. 245 P 211-221

記事言語:

http://doi.org/10.7209/tanso.2010.211

解説

There are many methods for the preparation of a carbon-based thin film, resulting in a variety structures and characteristics. Chemical vapor deposition (CVD) methods have been have been particularly important for their preparation. In this review of various CVD methods, chemical vapor infiltration, low pressure CVD, and plasma-assisted CVD methods are covered. Preparation methods, structures and properties of the carbon-based thin films produced, and their application to functional devices such as lithium-ion batteries are described.

Copyright © 2010 炭素材料学会

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