Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Influences of Lignophenol-Derivatives on Performances of Photo-Chemical Cells
Mitsuru AoyagiNao UmetaniMasamitsu Funaoka
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2009 年 34 巻 4 号 p. 683-686

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Hinoki Cypress (Chamaecyparis obtusa)-lignophenol (p-cresol type, HCLC), which is directly and quantitatively synthesized from wood through the phase-separation system, hydroxymethylated HCLC (HCLC-HM) and polymerized HCLC-HM by heat-set (HCLC-HM-P) were used as materials for photo-sensitizers for nano-porous TiO2 electrodes. In order to investigate influences of structural features of lignophenol derivatives, HCLC, HCLC-HM and HCLC-HM-P were reacted under alkaline conditions at 140℃ (neighbouring group participation) and 170℃ (arylmigration). After these derivatives were investigated by ionization difference spectra using UV-Vis, FT-IR, 1H-NMR and GPC, all derivatives were used as photo-sensitizers. There were different tendencies of HCLC from both HCLC-HM and HCLC-HM-P derivatives. As both HCLC-HM and HCLC-HM-P derivatives kept their polymeric structures, not only arylcoumaran or stilbene but also quinoid type structures acted as good photo absorbers. Based on these results, HCLC-HM-P-TiO2 electrodes polymerized directly demonstrated Voc = 0.48 V, Isc = 4.00mAcm-2, FF = 0.61 and η = 1.06 % under 100.0 mWcm-2 of visible light irradiation. Especially Isc was drastically improved. Moreover hardwood lignophenol showed same tendency.

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© 2009 The Materials Research Society of Japan
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