Regular Papers
Preparation of TiO2 thin films by RF magnetron sputtering method and their photocatalytic properties
2010 年 35 巻 4 号 p. 901-904
詳細
2010 年 35 巻 4 号 p. 901-904
Low-temperature preparation of the TiO2 thin films was examined by using a RF magnetron sputtering method. TiO2 films of anatase structure were prepared on the non-heated glass substrates. The photocatalytic properties of films were superior in the films prepared under the sputtering atmosphere of 10 Pa rather than 5 Pa. They showed high activities in the organic material-resolution characteristics. They also had high activity in the hydrophilicity characteristics.
