2011 年 36 巻 3 号 p. 495-498
Carbon thin films were prepared on the carbide steel cylinder rod using new magnetron sputtering deposition method to prevent their corrosion and/or increasing friction coefficient. In this method, plasmas move toward axial direction using modulated magnetic field which was generated by low frequency alternating coil current. Experimental results suggest surface roughness of the film decreased to ~10 nm from >100 nm (substrate) by this deposition. Uniformity of the ion saturation current and film thickness increased by modulated magnetic field. Deposition rate of carbon films prepared using RF discharge at 50 W was higher than that using DC discharge at 500 V and 30mA, however hardness of the film prepared by DC discharge was higher than that by RF discharge.