Nanoparticle Formation by Tungsten Ion Implantation in Glassy Carbon

抄録

Nanoparticles were formed by 100-keV tungsten-ion implantation in unpolished glassy carbon substrates at different fluences. The implanted samples were analyzed by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, hydrodynamic voltammetry using a rotating disk electrode, and field emission scanning electron microscopy. A significant sputtering effect changed the depth profile during the course of irradiation and limited the amount of tungsten that could be retained on the substrate, which saturated at a fluence of around 6 × 10¹⁶ ions/cm². The observed depth-profile change and saturation can be explained quantitatively by the calculated sputtering yield. The nanoparticles of tungsten carbides with diameters of around 16 nm were dispersed uniformly on the surface.