2018 Volume 43 Issue 5 Pages 275-278
Five types of diamond-like carbon (DLC) films {DC pulse CVD (Benzene), RFCVD (Butylbenzene), Ionization (Benzene), HiPIMS (Carbon), RFCVD (Pyrrole)} with different sources and methods were deposited on Si substrate. Oxygen plasma treatment by RF Capacitively Coupled Plasma was uniformly applied to these DLC films. The film thickness linearly decreased with plasma treatment time. In all substrates, the C═O rate of the film surface was increased by the oxygen plasma treatment for 0.5 minutes, and the C═O rate was constant for further treatment time. Moreover, the full width at half maximum (FWFM) of the XPS Carbon 1s (C1s) spectra of the DLC film deposited by hydrocarbon gas was constant to the depth direction. However, in the any DLC films, the FWHM of XPS C1s spectra was greatly changed in the surface layer and the middle layer of the DLC film. Therefore, it was suggested that in the DLC films using a hydrocarbon gas (Benzene, Butylbenzene) as a material, the FWHM are constant. On the other hand, in the HiPIMS using carbon as a material, the FWHM increased in the middle part of the film. In RFCVD using pyrrole as a material, the FWHM at the surface layer increased. It was suggested that the structure was different between the film surface layer and the middle layer depending on the film deposition method and materials.
