日本機械学会論文集
Online ISSN : 2187-9761
ISSN-L : 2187-9761

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活性酸素種による表面改質におよぼす紫外線ランプとポリスチレン製細胞培養基板との距離の影響
細谷 和輝高橋 一成大家 渓岩森 暁
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論文ID: 17-00561

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Surface modification of polystyrene (PS) dish used as a cell culture substrate is an indispensable strategy to enhance cell adhesion. In general, plasma treatment is employed to enhance the hydrophilic nature on the PS dish surface, and sterilization treatment of the PS dish is performed after the plasma treatment. We reported on a simultaneous process of surface modification and sterilization on the PS dish in a sterilization bag by using active oxygen species (AOS) generated via ultraviolet (UV) lamps, whose wavelength are 185 and 254 nm respectively. Herein, we attempt to investigate the dependency of the distance between UV lamp and PS dish on the surface modification by using the AOS. After exposure of AOS, the oxygen content of the PS dish was increased, whereas the water contact angle was decreased along with the decrement of the distance between PS dish and UV lamp owing to increase in the AOS concentration. Cell adhesion was also enhanced with decrease of the distance between PS dish and UV lamp compared with untreated PS. Especially, chemical states such as atomic concentration and chemical bonding affect cell adhesion rather than the surface wettability. Illumination of the UV lamps and AOS concentration at the PS dish surface affects the resultant cell adhesion.

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