Development of Highly-Efficient Loose Abrasive Polishing Technology Using AC Electric Field

JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS

Online ISSN : 2189-9967
Print ISSN : 0915-1168
ISSN-L : 0915-1168

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Development of Highly-Efficient Loose Abrasive Polishing Technology Using AC Electric Field

Hiroshi IKEDA, Yoichi AKAGAMI

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Keywords: AC electric field, CMP, loose abrasive polishing, surface roughness, removal rate, cerium oxide, slurry distribution, tribochemical reaction, glass substrate

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2014 Volume 59 Issue 12 Pages 752-758

DOI https://doi.org/10.18914/tribologist.59.12_752

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© 2014 Japanese Society of Tribologists

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